More efficient and cost-effective production of microelectronics components

Advances in e-beam lithography

The IndiNaPoly project aims to close the gap between sensitivity and resolution in e-beam lithography. Our focus is on making this technology usable for the production of chips in medium quantities of 1,000 to 100,000 per year.

By individually adapting the binder polymer according to a modular principle and coordinating the lithographic process steps with the respective polymer, we are developing a better understanding of the relationship between polymer structure and imaging properties. This should lead to the development of new resists that achieve resolutions of less than 20 nm with 6 to 7 times higher sensitivity.

In addition, shorter process cycles contribute to energy savings and a reduction in the carbon footprint. We are also examining sustainability aspects such as the substitution of fossil-based process chemicals and the recyclability of production waste.

In a highly competitive environment in which countries such as China and Taiwan are investing heavily in semiconductor technologies, the German semiconductor industry is dependent on continuous investment in research and development. The IndiNaPoly project represents an important step toward making the production of microelectronic components more efficient and cost-effective.

The collaboration between the Fraunhofer institute for Structural Durability and System Reliability LBF and the Fraunhofer institute for Electronic Nano Systems ENAS is crucial for the implementation of these innovative approaches.

E-beam lithography optimized for mass production of semiconductor components

The main objective of the IndiNaPoly project is to optimize the performance of e-beam lithography in order to make it suitable for the mass production of semiconductor components. This will be achieved by developing new resists formulated with tailor-made synthesized polymers and by precisely adjusting the lithography process to these resists.

Efficient and cost-effective:

The new resists aim to produce more compact and reliable microelectronics components more efficiently and cost-effectively. In addition, shorter process cycles are expected to contribute to energy savings and a reduction in the carbon footprint.

Sustainability:

The project also takes important sustainability aspects into account, such as the substitution of fossil-based process chemicals and the recyclability of production waste.

Suppliers and manufacturers in the electronics and semiconductor industry benefit

The results of the "IndiNaPoly"-project will benefit manufacturers of specialty polymers and chemical products for the electronics industry, as well as resist manufacturers and producers of semiconductors and other electronic products. The new resists are designed to manufacture more compact and reliable microelectronic components faster and more cost-effectively, adapting existing processes and developing new ones.

The collaboration between the Fraunhofer Institute for Structural Durability and System Reliability LBF and the Fraunhofer Institute for Electronic Nano Systems ENAS is essential for this innovation.

Subproject 1: Synthesis of new, adapted resist polymers and formulation of customized resists

The first subproject of IndiNaPoly focuses on the development of new resist polymers under the leadership of the Fraunhofer Institute for Structural Durability and System Reliability LBF. The expertise of Fraunhofer LBF is being used to close the gap between sensitivity and resolution in e-beam lithography.

As part of the work at Fraunhofer LBF, the binder polymer of the coating is individually customized according to the modular principle. Through feedback from the lithography process on the imaging properties and processability, Fraunhofer LBF is developing an in-depth understanding of the relationship between polymer structure and its behavior in the lithography process. The goal is to develop a resist that achieves resolutions of less than 20 nm with 6 to 7 times the sensitivity.

Fraunhofer LBF also evaluates sustainability aspects, such as the substitution of fossil-based process chemicals with those from renewable raw materials and the recyclability of production waste. The work of Fraunhofer LBF is therefore of central importance for innovation and the future of e-beam lithography in the IndiNaPoly project.

Subproject 2: Evaluation of the resist platform in terms of industrial usability and integration into an industry-oriented technology process sequence

The second subproject of IndiNaPoly focuses on optimizing lithographic process steps under the leadership of the Fraunhofer Institute for Electronic Nano Systems ENAS.

ENAS characterizes and evaluates the manufactured resist samples with regard to their use in e-beam lithography. This involves determining operating points, e.g., for the coating step, exposure dose, or in the development process. Furthermore, the resists are qualified for structuring various material systems for photonic applications as well as superconducting materials and material systems for quantum computing with regard to sufficient etching stability or methods for residue-free removal after structuring.

Constant feedback of the results to Fraunhofer LBF ensures continuous improvement of the resists and the polymers they contain.

Finally, the results are validated in customer-oriented demonstrators.