Fraunhofer with its institutes LBF and ENAS

The Fraunhofer Prepare project IndiNaPoly is driving forward the further development of e-beam lithography to enable the cost-efficient and energy-optimized production of microelectronics components in medium quantities (1,000–100,000 per year). The focus is on developing novel resists with tailor-made polymers that offer resolutions below 20 nm while simultaneously increasing sensitivity. Individually customized process steps, shorter cycle times, and the use of sustainable materials not only increase production quality but also reduce the carbon footprint. Manufacturers and suppliers in the semiconductor industry benefit from an innovative technology that combines efficiency, reliability, and sustainability - supported by close collaboration between the Fraunhofer institutes LBF and ENAS.